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Europium (Eu) Sputtering Target

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Product Details

CompositionEu
CAS Number7440-53-1
Purity≥99%
ShapeDiscs, or Custom-made
Diameter2″, 3″, 4″, 5″, 6″, or customized
Thickness0.25″, 0.125″, or customized
Bond TypeCopper, or customized

Europium (Eu) Sputtering Target Description

The Europium (Eu) Sputtering Target is engineered for high-precision sputtering applications, delivering outstanding performance and consistency. With a purity of ≥99% and custom-made shapes, this target is optimal for thin film deposition in microelectronics, display technology, and other critical industrial processes. Its excellent physical properties, including a melting point of 822℃ and a density of 5.24 g/cm³, ensure reliable operation under demanding conditions.

Europium (Eu) Sputtering Target Specification

ParameterValue
MaterialEuropium
Purity≥99%, or customized
Color/AppearanceSilvery Metallic
Melting Point822℃
Density5.24 g/cm³
SputterDC
Type of BondN/A
Available SizesDia.: 2″, 3″, 4″, or customized

Europium (Eu) Sputtering Target Applications

· Thin Film Deposition: Essential for fabricating high-quality coatings in microelectronics and display screens.
· Optoelectronics: Used in the production of light-emitting devices and lasers.
· Microfabrication: Ideal for creating precise structures in semiconductor manufacturing.
· Scientific Research: Utilized in laboratories for the development of experimental materials and coatings.
· Custom Industrial Coatings: Suited for various applications requiring durable, high-performance thin films.

Europium Sputtering Target Packing

Our products are packaged in customized cartons of various sizes based on the material dimensions. Small items are securely packed in PP boxes, while larger items are placed in custom wooden crates. We ensure strict adherence to packaging customization and the use of appropriate cushioning materials to provide optimal protection during transportation.

Packaging: Carton, Wooden Box, or Customized.

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